Annealing Systems
GEMSTARTM Benchtop Annealling system anneals substrates in a vacuum controlled user selectable gas environment.
The system is designed to provide the user with the most uniform films possible even in challenging high aspect ratio through-hole applications.
Precise films require state-of-the-art controls. Arradiance system maintains control over key parameters
such as exposure, purge, background pressure and temperature at all zones.
Some key features of the system include:
- Up to 200mm sq substrates and 3D objects 60mm tall.
- Customizable end effector allows clean, simple and repeatable loading of substrates Up to 500⁰C dual zone process reactor with substrate thermal control to ± 5°C.
- Distributed gas delivery insures uniform gas distribution over the entire substrate.
- System pressure monitoring.
- All metal seal gas handling.
- MFC controlled user selectable gas input.
- CF 2.75 flange reactor interface for easy attachment of optional QCM or mass spectrometer