ATSL - Advanced Technological Solutions Ltd.

Thin Film Measurement Systems

We offer SemiconSoft Inc cost effective Spectroscopic Reflectometers, thin-film thickness measurement instruments and Film Sense, Multi Wavelength Ellipsometer systems.

Any translucent material in 1nm - 1mm thickness range can be measured quickly and reliably.

SemiconSoft Inc Spectroscopic Reflectometers are able to measure film stack thicknesses, using highly sophisticated software with a library of more than 500 materials.

The user can create his own material files easily.

TheTFCompanion application supports large number of parameterized material types from Cauchy to Tauc-Lorentz to Drude approximations to represent optical constants dispersion and enable n&k measurement.  

The MProbe 20 is a bench top system with manual or motorized stage for mapping 6", 8" or 12" substrates.

The MProbe 40 is a micro spot version, with integrated microscope and spot size down to 4µm. measurement location can be viewed and selected using CCD camera.  

SemiconSoft solutions are available for a variety of applications, from desktop and in-situ to in-line measurement.

Typical applications:

• Oxides, nitrides, semiconductors, photoresists
• Thin-film solar cells
• Adhesives
• LCD and touch screens
• Thin metals (up to 40nm)
• Hard coatings
• Biomedical coatings
• Polymer layers
• Polymer web

Film Sense FS Multi Wavelength Ellipsometer

We offer the FS Multi Wavelength Ellipsometer for thin films accurate measurements.

The FS is an easy to use, affordable and highly advanced multi Wavelength Ellipsometer for determine thin films thickness, index of refraction, surface roughness and film composition.

The system uses Long lifetime (>50,000 hours) Multiple LED as light sources.

No moving parts in the ellipsometric detector- Fast and reliable measurement (banded wavelength data in 10ms) and long term reliability.

Excellent thickness precision- better than 0.001nm for many samples (for a 1 second acquisition), even for sub-monolayer film thicknesses.

Integrated computer for instrument control and data analysis, with a web browser interface accessible from any modern computer, laptop, or tablet.

Advantages of 4 and 8 Wavelengths

Enable unique determination of film thickness, for transparent films up to at least 5μm (no thickness periodicity issues).

Determine additional sample parameters, such as: surface roughness, multiple film thicknesses, index dispersion.

Provide a consistency check on the data analysis: a “good” analysis model should fit the data at all wavelengths (the Fit Diff. parameter quantifies the “quality of fit”).

Fast Mapping systems for up to 300mm wafers mapping. 

S-1 In Situ Monitoring

In Situ measurements, applicable to most thin film deposition techniques: Sputtering, ALD, MBE, MOCVD, e‑beam evaporation, etc.

Capabilities:

Sub-monolayer thickness precision, in real time.

Determine deposition rates and film optical constants n&k, at multiple process conditions, without breaking vacuum.

Monitor and control the deposition of multilayer film structures.

FS-API interface for external software control (LabVIEW™ compatible).

Typical Applications for the FS-1:

• Semiconductor industry: silicon oxide and nitrides, high and low k dielectrics, amorphous and polycrystalline silicon films, photoresists.
• Optical Coatings industry:  high and low index films such as SiO₂, TiO₂, Ta₂O₅, MgF₂, etc.
• Display industry:  TCO’s (such as ITO), amorphous silicon films, organic films (for OLED technology).
• Data Storage industry: diamond like carbon (DLC) films.
• Process R&D:  in situ characterization of film deposition (rate and optical constants) vs. process conditions, applicable to MBE, MOCVD, ALD, Sputtering, etc.
• Chemistry and Biology:  detection of sub-monolayer material adsorption in liquid cell experiments.
• Industrial:  in-line monitoring and control of film thickness.