Automated Optical Inspection Systems

Automated Optical Inspection System

Nanotronics Imaging (USA) tools, measure particle size and dispersion, detect surface features, and analyze problematic processing defects using A.I.

Training the A.I. analyzer is as simple as showing it samples of defects and naming the classifications you want to use for those defects. After a few “learning” sessions the AI analyzer will recognize and classify those defects automatically.

The system also includes a device inspection method, that builds an ideal device template, compares it to other devices and flags any areas that deviate from the ideal template.

This highly automated tool, creates repeatable inspection results and reduces the chance of operator error and false positives.

Applications examples:wafer

Process Monitoring for Patterned, Epi, SiC, Diced wafers and Individual Devices.

3D topography offers volumetric information and count, Filler dispersion, presence of agglomerates and the properties of polymer matrix.

Pits, scratches, cracks, particles or any other feature and defects classification by size, frequency and morphology.

3D surface topography, using multiple light vectors.

Inspection of transparent samples such as glass and optical lenses.

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Key features and technologies used:

  • Deep Learning, advanced AI capabilities for maximum flexibility.
  • Golden Template Capability.
  • Automated wafers handler for 50/75/100/150/200 or 300mm.
  • Custom-build automated handling equipment for non-wafer applications.
  • Sample chucks for: diced wafers on hoop rings, gel packs box, masks, and broken pieces. We will customize sample chucks and fixtures to accommodate your specific needs.
  • Multiple imaging techniques including Brightfield, Darkfield and DIC (Nomarski).
  • Optional UV and IR illumination for inspection processes.
  • Autofocus capabilities in predefined locations or prior to every image capture.
  • The system uses a contrast-based algorithm which allows autofocus on completely transparent or highly reflective materials.
  • Multiple Resolution Settings Ranging from 0.3 μm and greater
  • Customizable Defect Reports
  • Robust Analysis for Defect or Feature of Interest Detection and Classification
  • Inspection and Review Procedures
  • Small Footprint and Minimal Facilities Requirements

nSpec® is LIMS systems compatible and can be integrated with standard software, SECS/GEM, Klarity (KLARF import/export), and proprietary process control.

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