Non contact Sheet Resistance

Suragus (Germany) Non-contact Sheet Resistance and layer Thickness Mapping systems, will measure and map your samples with high lateral resolution and will provide accurate measurements (down to 2% accuracy with 1% repeatability) across the all sample.

These systems are able to measure extreme sheet resistance values, down to 0.1mOhm/sq and layer thickness down to 2nm.

Suragus offers a line of instrumentation, starting from a single point hand held measurement tools, all the way to full scale, large samples high resolution mapping systems.

In-line installations (in vacuum chambers as well) are offered for direct process control, providing real time feedback to enable on the fly process parameters adjustments.

The eddy current testing method, utilizes local conductivity variations for the characterization of quality characteristics of the sample.

  • Metal layer thickness measurement from 2 nm – 2 mm
  • Sheet resistance from 0.1 mOhm/sq to 100k Ohm/sq
  • Material homogeneity
  • Physical changes in the sample
  • Measurements of encapsulated films & multilayer systems

wafer

Applicable processes and applications:

  • Deposition (CVD, PVD, Plating)
  • ALD
  • Implantation, Doping
  • Etching, Polishing
  • Annealing/Tempering
  • (De)-oxidation
  • Defect detection
  • Impurities
  • Cracks
  • Deposition effects
  • Optional mapping of optical transparency

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Spectroscopic Reflectometers
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